The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Sep. 25, 2009
Ryuji Sakaguchi, Ichihara, JP;
Ryuji Sakaguchi, Ichihara, JP;
Showa Denko K.K., Tokyo, JP;
Abstract
There is provided a method for manufacturing a perpendicular magnetic recording medium that includes a step for forming a smooth substrate surface without generating abnormal protrusions or the like when forming a magnetic film or the like on the surface of the substrate, the method for manufacturing a perpendicular magnetic recording medium characterized by including a polishing step in which the surface of a non-magnetic substrate is smoothed before forming the laminated structure on top of the non-magnetic substrate, wherein a polishing liquid used in the polishing step contains diamond particles within a range from 0.001 to 0.05% by mass and also contains a polishing accelerator within a range from 10 to 100 times the amount of diamond particles, and the polishing accelerator is an organic polymer material containing a sulfonic group or a carboxylic group and having an average molecular weight of 4,000 to 10,000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile