The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2013
Filed:
Feb. 19, 2010
Liyuan Bao, Fremont, CA (US);
Anbei Jiang, Sunnyvale, CA (US);
Sio on Lo, Fremont, CA (US);
Yukari Nishimura, Sunnyvale, CA (US);
Joseph F. Sommers, San Jose, CA (US);
Samantha S. H. Tan, Fremont, CA (US);
Liyuan Bao, Fremont, CA (US);
Anbei Jiang, Sunnyvale, CA (US);
Sio On Lo, Fremont, CA (US);
Yukari Nishimura, Sunnyvale, CA (US);
Joseph F. Sommers, San Jose, CA (US);
Samantha S. H. Tan, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Non-metallic deposits are selectively removed from aluminum containing substrates such as aluminum faceplates using a selective deposition removal (SDR) solution. The SDR solution does not substantially etch the faceplate holes, thereby preserving the hole diameter integrity and increasing the number of times the faceplate may be cleaned or refurbished while remaining within processing hole diameter tolerances. In an embodiment, the SDR solution comprises, in wt % of the solution, 15.5%+/−2% HF or buffered HF acid, 3.8%+/−0.5% NHF pH buffer, 59.7%+/−5% ethylene glycol, and the balance HO.