The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2013

Filed:

Nov. 04, 2009
Applicants:

Geoffrey G. Harris, Midland, CA;

Daniel B. Mitchell, Port McNicoll, CA;

Douglas J. Brown, Midland, CA;

Alexandre D. Lifchits, Wyevale, CA;

Inventors:

Geoffrey G. Harris, Midland, CA;

Daniel B. Mitchell, Port McNicoll, CA;

Douglas J. Brown, Midland, CA;

Alexandre D. Lifchits, Wyevale, CA;

Assignee:

Raytheon Canada Limited, Ottawa, Ontario, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); G02B 5/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method involves forming a first surface on a substrate, applying to the first surface a layer of a material having a thickness less than approximately 10 microns, and precision polishing the layer of material to form a precision optical second surface on a side of the layer opposite from the substrate. A different aspect involves an apparatus that includes a substrate having a first surface, and a layer provided on the surface and having a thickness less than approximately 10 microns, the layer having on a side thereof opposite from the substrate a polished second surface with an RMS surface roughness less than approximately 10 Angstroms.


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