The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2013
Filed:
Dec. 30, 2009
Baojun LI, Sharon, MA (US);
Naveen Stephan Chandra, Kenosha, WI (US);
Jed Douglas Pack, Glenville, NY (US);
Jiang Hsieh, Brookfield, WI (US);
Xiaoye Wu, Rexford, NY (US);
Mary Sue Kulpins, Brookfield, WI (US);
Baojun Li, Sharon, MA (US);
Naveen Stephan Chandra, Kenosha, WI (US);
Jed Douglas Pack, Glenville, NY (US);
Jiang Hsieh, Brookfield, WI (US);
Xiaoye Wu, Rexford, NY (US);
Mary Sue Kulpins, Brookfield, WI (US);
General Electric Company, Schenectady, NY (US);
Abstract
A method is provided that includes acquiring a first set of image data from X-rays produced at a first energy level and a second set of image data from X-rays produced at a second energy level. The method includes generating a first noise mask for a first basis material and a second noise mask for a second basis material and removing pixels corresponding to cross contaminating structural information from the first noise mask and the second noise mask. The method includes processing a first materially decomposed image generated from the first set of image data and the second set of digital data using the second noise mask after removal of the cross contaminating structural information and processing a second MD image generated from the first set of image data and the second set of digital data using the first noise mask after removal of the cross contaminating structural information.