The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2013
Filed:
Jan. 27, 2010
Hirotaka Akao, Tokyo, JP;
Yuriko Kaino, Kanagawa, JP;
Takahiro Kamei, Kanagawa, JP;
Masaki Hara, Kanagawa, JP;
Kenichi Kurihara, Kanagawa, JP;
Hirotaka Akao, Tokyo, JP;
Yuriko Kaino, Kanagawa, JP;
Takahiro Kamei, Kanagawa, JP;
Masaki Hara, Kanagawa, JP;
Kenichi Kurihara, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A film deposition method includes the steps of: coating a solution containing a polysilane compound on a substrate to form a coating film and then carrying out a first thermal treatment in an inert atmosphere, thereby forming the coating film into a silicon film; forming a coating film containing a polysilane compound on the silicon film and then carrying out a second thermal treatment in an inert atmosphere or a reducing atmosphere, thereby forming the coating film into a silicon oxide precursor film; and carrying out a third thermal treatment in an oxidizing atmosphere, thereby forming the silicon oxide precursor film into a silicon oxide film and simultaneously densifying the silicon film.