The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2013
Filed:
Nov. 06, 2009
Applicants:
Dujiang Wan, Fremont, CA (US);
Hai Sun, Milpitas, CA (US);
Hongping Yuan, Fremont, CA (US);
Ling Wang, Hercules, CA (US);
Xianzhong Zeng, Fremont, CA (US);
Inventors:
Dujiang Wan, Fremont, CA (US);
Hai Sun, Milpitas, CA (US);
Hongping Yuan, Fremont, CA (US);
Ling Wang, Hercules, CA (US);
Xianzhong Zeng, Fremont, CA (US);
Assignee:
Western Digital (Fremont), LLC, Fremont, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods of patterning a material are disclosed. A first resist pattern is formed on a field. A protective layer is formed over the first resist pattern and at least a portion of the field. A second resist pattern is formed over a portion of the protective layer. A portion of a material to be patterned deposited adjacent to the first and second resist patterns is removed.