The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2013
Filed:
Sep. 24, 2009
Joseph Martin Patterson, Carlsbad, CA (US);
Joseph Martin Patterson, Carlsbad, CA (US);
Applied Micro Circuits Corporation, Sunnyvale, CA (US);
Abstract
A method is provided for laser patterning an integrated circuit (IC) etching mask. The method provides an IC packaged die with a first region underlying a backside surface of a bulk silicon (Si) layer. An etch-resistant film is formed overlying the backside surface. Alternately, the entire IC die package is conformally coated. A semi-transparent film is formed overlying the etch-resistant film, semi-transparent to light having a first wavelength. In response to irradiating the semi-transparent film with light having a first power density, an IC die first region is located. In response to irradiating the semi-transparent film with a laser light having a second power density, greater than the first power density, an area of etch-resistant film overlying the first region is decomposed. More explicitly, an area of semi-transparent film overlying the first region is ablated, and the etch-resistant film underlying the ablated semi-transparent film is heated.