The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2013
Filed:
Mar. 16, 2010
Kazutoshi Emoto, Tokyo, JP;
Kiyonori Hinoki, Tokyo, JP;
Masahiro Saegusa, Tokyo, JP;
Haruka Nishimura, Tokyo, JP;
Kazutoshi Emoto, Tokyo, JP;
Kiyonori Hinoki, Tokyo, JP;
Masahiro Saegusa, Tokyo, JP;
Haruka Nishimura, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
A liquid application apparatus includes a guide roll for guiding a sheet for application, and a slit die for applying a liquid to a surface of the sheet for application from an opening. The slit die has an upper layer flow path and a lower layer flow path spaced in the rotational direction of the guide roll and joining at the opening. In a cross section perpendicular to the axis of the guide roll, an angle α formed by the center line of the upper layer flow path and the center line of the lower layer flow path is 0.5 to 25°, an angle β formed by a line connecting the intersection point of the center line of the upper layer flow path and the center line of the lower layer flow path with the axis of the guide roll and by the center line of the upper layer flow path is 0 to 70° as measured from this connecting line toward the center line of the upper layer flow path in the direction opposite to the rotational direction of the guide roll, and the distance γ between a point where the two flow paths and join and the opening is 0.05 to 2.8 mm.