The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Mar. 03, 2009
Noboru Higashi, Neyagawa, JP;
Naomi Kariyama, Neyagawa, JP;
Akifumi Ikehata, Tsukuba, JP;
Kurashiki Boseki Kabushiki Kaisha, Kurashiki-shi, JP;
Abstract
In far ultraviolet spectroscopy using attenuated total reflection, total reflection light is measured by using evanescent waves of total reflection light. The penetration depth thereof is equal to or larger than 150 nm in a wavelength range in the far ultraviolet range wherein the penetration depth depends on a wavelength of the far ultraviolet light, refractive index of an object to be measured, refractive index of optical material of the probe and incident angle of the far ultraviolet light at an interface between the probe and the object. The attenuated total reflection probe is made of an optical material selected so as to have the penetration depth equal to or higher than 150 nm in far ultraviolet wavelength range, and the probe makes contact with the object to be measured at the interface, and the far ultraviolet light is incident on the interface at incident angle larger than critical angle in the wavelength range so as to have the penetration depth equal to or higher than 150 nm. The total reflection light from the interface is measured, and absorbance of the object to be measured is determined.