The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Apr. 04, 2008
Alexander Mangold, Ludwigshafen, DE;
Udo Becker, Heiligkreuzsteinach, DE;
Steffen Diez, Heidelberg, DE;
Roland Kaplan, Heidelberg, DE;
Alexander Mangold, Ludwigshafen, DE;
Udo Becker, Heiligkreuzsteinach, DE;
Steffen Diez, Heidelberg, DE;
Roland Kaplan, Heidelberg, DE;
Heidelberg Instruments Mikrotechnik GmbH, Heidelberg, DE;
Abstract
A pattern, is imaged by means of a programmable mask, on a substrate that has a photosensitive layer, illumination spots being produced on the mask by means of an illumination unit and individual pixels being produced, via an optical unit, forming a grid of pixels on the substrate corresponding to the pattern. Structure edges that are to be reproduced on the substrate are positioned optimally. To this end at least two exposure processes for the photosensitive layer are performed, the illumination spots or exposure points of which are offset from one another. Thereby, spaces in the grid of pixels of the first exposure process, which spaces are proportionate to the number of exposure processes to be effected, are filled with pixels by the subsequent exposure processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile