The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2013

Filed:

Mar. 05, 2010
Applicants:

Hamza Yilmaz, Saratoga, CA (US);

Madhur Bobde, San Jose, CA (US);

Yeeheng Lee, San Jose, CA (US);

Lingpeng Guan, Sunnyvale, CA (US);

Xiaobin Wang, Santa Clara, CA (US);

John Chen, Palo Alto, CA (US);

Anup Bhalla, Santa Clara, CA (US);

Inventors:

Hamza Yilmaz, Saratoga, CA (US);

Madhur Bobde, San Jose, CA (US);

Yeeheng Lee, San Jose, CA (US);

Lingpeng Guan, Sunnyvale, CA (US);

Xiaobin Wang, Santa Clara, CA (US);

John Chen, Palo Alto, CA (US);

Anup Bhalla, Santa Clara, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01); H01L 29/94 (2006.01); H01L 31/062 (2012.01); H01L 31/113 (2006.01); H01L 31/119 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention discloses semiconductor power device disposed on a semiconductor substrate of a first conductivity type. The semiconductor substrate supports an epitaxial layer of a second conductivity type thereon wherein the semiconductor power device is supported on a super-junction structure. The super-junction structure comprises a plurality of trenches opened from a top surface in the epitaxial layer; wherein each of the trenches having trench sidewalls covered with a first epitaxial layer of the first conductivity type to counter charge the epitaxial layer of the second conductivity type. A second epitaxial layer may be grown over the first epitaxial layer. Each of the trenches is filled with a non-doped dielectric material in a remaining trench gap space. Each of the trench sidewalls is opened with a tilted angle to form converging U-shaped trenches.


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