The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2013

Filed:

Jan. 03, 2011
Applicants:

Chih-hsiang Lin, Taipei, TW;

Ya-lan Chuang, Lioujia Township, Tainan County, TW;

Pei-jung Tsat, Cingshuei Township, Taichung County, TW;

Shu-ling Yeh, Yangmei Township, Taoyuan County, TW;

Chin-lang Wu, Tongsiao Township, Miaoli County, TW;

Cing-jiuh Kang, Hsinchu, TW;

Hsin-ching Kao, Baoshan Township, Hsinchu County, TW;

Inventors:

Chih-Hsiang Lin, Taipei, TW;

Ya-Lan Chuang, Lioujia Township, Tainan County, TW;

Pei-Jung Tsat, Cingshuei Township, Taichung County, TW;

Shu-Ling Yeh, Yangmei Township, Taoyuan County, TW;

Chin-Lang Wu, Tongsiao Township, Miaoli County, TW;

Cing-Jiuh Kang, Hsinchu, TW;

Hsin-Ching Kao, Baoshan Township, Hsinchu County, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G 63/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The disclosed is a copolymer having a formula as: Ris a combination of naphthalene, phenylene, butyl, and hexyl. Ris a combination of ethylene, cyclohexlene, 2-methylpropyl, and neopentyl. n is a number of 1500 to 3000. The copolymer has a transparency greater than 80%, a thermal resistance greater than 100° C., a moisture absorption less than 0.5 wt %, and yellowing under UV/climate resistance greater than 1000 hours.


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