The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Dec. 23, 2009
Chang Ho Cho, Anseong-si, KR;
Keon Woo Lee, Daejeon, KR;
Sung Hyun Kim, Daejeon, KR;
Sang Kyu Kwak, Daejeon, KR;
Dong Kung OH, Daejeon, KR;
Chang Soon Lee, Daejeon, KR;
Chang Ho Cho, Anseong-si, KR;
Keon Woo Lee, Daejeon, KR;
Sung Hyun Kim, Daejeon, KR;
Sang Kyu Kwak, Daejeon, KR;
Dong Kung Oh, Daejeon, KR;
Chang Soon Lee, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers.