The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Dec. 30, 2009
Ki Lyoung Lee, Hwaseong-si, KR;
SA RO Han Park, Yongin-si, KR;
Ki Lyoung Lee, Hwaseong-si, KR;
Sa Ro Han Park, Yongin-si, KR;
Hynix Semiconductor Inc, Icheon-Si, KR;
Abstract
A method of forming fine patterns of a semiconductor device comprises forming sacrificial film patterns of a line type in a cell region of a semiconductor substrate and, at the same time, forming pad patterns in a peripheral region of the semiconductor substrate, forming a spacer on sidewalls of each of the sacrificial film patterns and the pad patterns, forming a gap-fill layer on sidewalls of the spacers to thereby form line and space patterns, including the sacrificial film patterns and the gap-fill layers, in the cell region, and separating the line and space patterns of the cell region at regular intervals and, at the same time, etching the pad patterns of the peripheral region to thereby form specific patterns in the peripheral region.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile