The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Nov. 19, 2009
Xiangxu Kong, Foster City, CA (US);
Gene Shen, Santa Clara, CA (US);
Andrei Fedorov, San Mateo, CA (US);
John Lyle, Fremont, CA (US);
Grace Lee, San Ramon, CA (US);
Lubomir Sebo, Redwood City, CA (US);
Duc DO, San Jose, CA (US);
Robert Weber, Mountain View, CA (US);
Stephen Dudek, San Francisco, CA (US);
Xiangxu Kong, Foster City, CA (US);
Gene Shen, Santa Clara, CA (US);
Andrei Fedorov, San Mateo, CA (US);
John Lyle, Fremont, CA (US);
Grace Lee, San Ramon, CA (US);
Lubomir Sebo, Redwood City, CA (US);
Duc Do, San Jose, CA (US);
Robert Weber, Mountain View, CA (US);
Stephen Dudek, San Francisco, CA (US);
Pacific Biosciences of California, Inc., Menlo Park, CA (US);
Abstract
Compositions, devices, systems and methods for reducing and/or preventing photo-induced damage of one or more reactants in an illuminated analytical reaction by addition of one or more photo-induced damage mitigating agents to the reaction mixture and allowing the reaction to proceed for a period that is less than a photo-induced damage threshold period.