The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2013

Filed:

Apr. 21, 2011
Applicants:

Gouri Radhakrishnan, Rancho Palos Verdes, CA (US);

Paul Michael Adams, Redondo Beach, CA (US);

Inventors:

Gouri Radhakrishnan, Rancho Palos Verdes, CA (US);

Paul Michael Adams, Redondo Beach, CA (US);

Assignee:

The Aerospace Corporation, El Segundo, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 31/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present application relates generally to methods for growth of high quality graphene films. In particular, a method is provided for forming a graphene film using a modified chemical vapor deposition process using an oxygen-containing hydrocarbon liquid precursor. Desirably, the graphene films are a single-layer and have a single grain continuity of at least 1 μm.


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