The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Oct. 30, 2008
Chantal Arena, Mesa, AZ (US);
Christiaan J. Werkhoven, Gilbert, AZ (US);
Ronald Thomas Bertram, Jr., Mesa, AZ (US);
Ed Lindow, Scottsdale, AZ (US);
Chantal Arena, Mesa, AZ (US);
Christiaan J. Werkhoven, Gilbert, AZ (US);
Ronald Thomas Bertram, Jr., Mesa, AZ (US);
Ed Lindow, Scottsdale, AZ (US);
Soitec, Bernin, FR;
Abstract
The present invention relates to the field of semiconductor processing and provides apparatus and methods that improve chemical vapor deposition (CVD) of semiconductor materials by promoting more efficient thermalization of precursor gases prior to their reaction. In preferred embodiments, the invention comprises heat transfer structures and their arrangement within a CVD reactor so as to promote heat transfer to flowing process gases. In certain preferred embodiments applicable to CVD reactors transparent to radiation from heat lamps, the invention comprises radiation-absorbent surfaces placed to intercept radiation from the heat lamps and to transfer it to flowing process gases.