The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Sep. 20, 2010
Martin Hacker, Jena, DE;
Thomas Pabst, Stadtroda, DE;
Ralf Ebersbach, Schmölln, DE;
Gerard Antkowiak, Jena, DE;
Wilfried Bissmann, Jena, DE;
Matthias Reich, Jena, DE;
Martin Hacker, Jena, DE;
Thomas Pabst, Stadtroda, DE;
Ralf Ebersbach, Schmölln, DE;
Gerard Antkowiak, Jena, DE;
Wilfried Bissmann, Jena, DE;
Matthias Reich, Jena, DE;
Carl Zeiss Meditec AG, Jena, DE;
Abstract
An ophthalmological biometric or image-producing system and method for detection and analysis of measurement data including a measurement arrangement with an illumination unit for illuminating the eye with at least one measurement beam, a signal detection unit for the detection of the light portions scattered or reflected back from the eye, a central control unit with an output unit, and a pattern generating unit which includes an optical scan unit, a control unit as well as a position sensor for measuring the realized deflections of the optical scan unit, whereby control unit, optical scan unit and position sensor can form a control circuit. Thereby, the position sensor, except for the connection within the possible control circuit, includes a connection to a unit of the measurement arrangement for optimizing measurement value logging or to the central control unit for correcting the biometric measurements or tomograms.