The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Jul. 26, 2011
Caihua Chen, Hauppauge, NY (US);
Carl Wittenberg, Water Mill, NY (US);
Chinh Tan, Setauket, NY (US);
Michael Steele, Wantagh, NY (US);
Edmond L Fratianni, Port Jefferson Station, NY (US);
Mark Drzymala, Commack, NY (US);
Edward Barkan, Miller Place, NY (US);
Caihua Chen, Hauppauge, NY (US);
Carl Wittenberg, Water Mill, NY (US);
Chinh Tan, Setauket, NY (US);
Michael Steele, Wantagh, NY (US);
Edmond L Fratianni, Port Jefferson Station, NY (US);
Mark Drzymala, Commack, NY (US);
Edward Barkan, Miller Place, NY (US);
Symbol Technologies, Inc., Holtsville, NY (US);
Abstract
An illumination time of an illumination system and/or an exposure setting of an imaging system are adjusted by a proximity system operative for detecting a product entering a field of view in a bi-optical, dual window, point-of-transaction workstation. The proximity system includes an infrared emitter for emitting infrared light to the product, and an infrared sensor for sensing return infrared light from the product. Multiple predefined thresholds are stored for the sensed return infrared light, and a predefined illumination time and/or exposure setting are stored and assigned to each predefined threshold. Adjustment of the illumination time and/or of the exposure setting is performed by comparing the sensed return infrared light from the product in real time operation with the stored predefined thresholds.