The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Nov. 10, 2008
Giacomo Stefano Roba, Monza, IT;
Massimo Nutini, Milan, IT;
Marco Ruzzier, Milan, IT;
Franco Veronelli, Lainate, IT;
Giacomo Stefano Roba, Monza, IT;
Massimo Nutini, Milan, IT;
Marco Ruzzier, Milan, IT;
Franco Veronelli, Lainate, IT;
Prysmian Cavi E Sistemi Energia S.R.L., Milan, IT;
Abstract
A method and device for manufacturing a preform for optical fibers through chemical deposition on a substrate for deposition arranged vertically is described, comprising a chemical deposition chamber including at least one gripping member rotatably mounted about an axis Z-Z and adapted to hold at least one end of at least one elongated element constituting a substrate for chemical deposition for the formation of a preform for optical fibers. The chamber includes, moreover, at least one burner which is mobile along a direction Z substantially parallel to said axis Z-Z and adapted to deposit, on said at least one elongated element, a chemical substance for the formation of a preform and at least one suction element for collecting exhaust chemical substances, said at least one suction element being arranged on the opposite side to said at least one burner with respect to said axis Z-Z and being mobile along said direction Z. Said at least one suction element is advantageously positioned at a different height (preferably lower) with respect to that of said at least one burner to optimise the fluid dynamic conditions inside the chemical deposition chamber.