The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2013

Filed:

Jul. 15, 2011
Applicants:

Je-hun Lee, Seoul, KR;

Do-hyun Kim, Seoul, KR;

Tae-hyung Ihn, Seoul, KR;

Inventors:

Je-Hun Lee, Seoul, KR;

Do-Hyun Kim, Seoul, KR;

Tae-Hyung Ihn, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An oxide or nitride semiconductor layer is formed over a substrate. A first conductive layer including a first element and a second element, and a second conductive layer including the second element are formed over the semiconductor layer. The first element is oxidized or nitrogenized near an interface region between the first conductive layer and the oxide or nitride semiconductor layer by heat treatment or laser irradiation. The Gibbs free energy of oxide formation of the first element is lower than those of the second element or any element in the oxide or nitride semiconductor layer.


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Lee, Je-Hun. (2013). Semiconductor device and manufacturing method thereof (U.S. Patent No. 8383465). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8383465

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