The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2013

Filed:

Sep. 01, 2011
Applicants:

Ji-young Park, Hwaseong-si, KR;

Shin-il Choi, Hwaseong-si, KR;

Jong-hyun Choung, Hwaseong-si, KR;

Sang Gab Kim, Seoul, KR;

Seon-il Kim, Seoul, KR;

Sang-tae Kim, Iksan-si, KR;

Joon-woo Lee, Jeonju-si, KR;

Young-chul Park, Iksan-si, KR;

Young-jun Jin, Iksan-si, KR;

Kyong-min Kang, Iksan-si, KR;

Suck-jun Lee, Jeonju-si, KR;

O-byoung Kwon, Wanju-gun, KR;

In-ho Yu, Iksan-si, KR;

Sang-hoon Jang, Jeonju-si, KR;

Min-ki Lim, Iksan-si, KR;

Yu-jin Lee, Iksan-si, KR;

Inventors:

Ji-Young Park, Hwaseong-si, KR;

Shin-Il Choi, Hwaseong-si, KR;

Jong-Hyun Choung, Hwaseong-si, KR;

Sang Gab Kim, Seoul, KR;

Seon-Il Kim, Seoul, KR;

Sang-Tae Kim, Iksan-si, KR;

Joon-Woo Lee, Jeonju-si, KR;

Young-Chul Park, Iksan-si, KR;

Young-Jun Jin, Iksan-si, KR;

Kyong-Min Kang, Iksan-si, KR;

Suck-Jun Lee, Jeonju-si, KR;

O-Byoung Kwon, Wanju-gun, KR;

In-Ho Yu, Iksan-si, KR;

Sang-Hoon Jang, Jeonju-si, KR;

Min-Ki Lim, Iksan-si, KR;

Yu-Jin Lee, Iksan-si, KR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An etchant according to exemplary embodiments of the present invention includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.05 wt % to about 3 wt % of copper salt, about 0.1 wt % to about 10 wt % of organic acid or organic acid salt, and water.


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