The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2013

Filed:

Feb. 03, 2011
Applicants:

Shin Ohya, Chuo-ku, JP;

Takashi Inoue, Ichihara, JP;

Takatoki Yamamoto, Bunkyo-ku, JP;

Teruo Fujii, Bunkyo-ku, JP;

Yasuyuki Sakai, Bunkyo-ku, JP;

Masaki Nishikawa, Bunkyo-ku, JP;

Hitomi Sakai, Bunkyo-ku, JP;

Hirosuke Naruto, Bunkyo-ku, JP;

Inventors:

Shin Ohya, Chuo-ku, JP;

Takashi Inoue, Ichihara, JP;

Takatoki Yamamoto, Bunkyo-ku, JP;

Teruo Fujii, Bunkyo-ku, JP;

Yasuyuki Sakai, Bunkyo-ku, JP;

Masaki Nishikawa, Bunkyo-ku, JP;

Hitomi Sakai, Bunkyo-ku, JP;

Hirosuke Naruto, Bunkyo-ku, JP;

Assignees:

Kisco Ltd., Osaka-Shi, Osaka, JP;

Daisan Kasei Co., Ltd., Tokyo, JP;

The University of Tokyo, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N 5/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention is directed to methods for the propagation or cultivation of cells including preparing a cell culture substrate, wherein the cell culture substrate includes a substrate and a layer formed by surface modification. The layer includes a polymer containing an amino group. The polymer is produced by reacting a polymer represented by formula (II): with a polymer having at least one amino group, —NH, capable of forming a Schiff base in a monomer of formula (II), thereby forming a polymer layer constituting the layer formed by surface modification. 'n' in Formula (II) is 0 or a positive integer, and m is a positive integer. n and m represent the degree of polymerization. Formula (II) is formed by chemical vapor deposition of formyl[2.2]paracyclophane. The methods further include providing cells in a medium; inoculating the cells onto the cell culture substrate; and culturing the cells, wherein the cells adhere to the cell culture substrate.


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