The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
May. 28, 2010
Toyomi Matsuda, Ashigarakami-gun, JP;
Makoto Sutou, Minami-ashigara, JP;
Tomonori Baba, Hadano, JP;
Daisuke Mitsuhashi, Minami-ashigara, JP;
Toyomi Matsuda, Ashigarakami-gun, JP;
Makoto Sutou, Minami-ashigara, JP;
Tomonori Baba, Hadano, JP;
Daisuke Mitsuhashi, Minami-ashigara, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
There are provided a pattern exposure method, a conductive film producing method, and a conductive film, wherein a photosensitive material is subjected to a proximity exposure through a photomask disposed with a proximity gap of 70 to 200 μm, and thereby is exposed in the mask pattern periodically in the conveying direction to obtain a conductive film. The conductive film has a plurality of conductive portions of first and second conductive thin metal wires and a plurality of opening portions. A side of each thin metal wire has a protrusion extending toward the opening portion from a virtual line representing a designed width of the thin metal wire, and the protruding amount of the protrusion is 1/25 to 1/6 of the designed width.