The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
May. 19, 2010
Applicants:
Changming LI, Singapore, SG;
Ling Yu, Singapore, SG;
Inventors:
Changming Li, Singapore, SG;
Ling Yu, Singapore, SG;
Assignee:
Nanyang Technological University, Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 37/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention refers to a method of manufacturing a micro patterned device. The method can comprise or consist of applying a light curable epoxy resin to a mold to obtain a curable resin filled mold. In a further step a polymeric film or an epoxy resin-coated glass is applied over the curable resin filled mold. Subsequently, the curable resin filled mold to which the polymeric film or the epoxy resin-coated glass is applied is irradiated to cure the resin. In another aspect the present invention refers to a micro patterned device obtained by a method described herein.