The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2013
Filed:
Jul. 09, 2010
Tohru Kiuchi, Tokyo, JP;
Hideo Mizutani, Yokohama, JP;
Tohru Kiuchi, Tokyo, JP;
Hideo Mizutani, Yokohama, JP;
Nikon Corporation, Tokyo, JP;
Abstract
When a segmented region SAof a sheet S is scan-exposed, a stage SSTadsorbs, at a standby position at the +X end portion of a scan region AS, a rear surface portion corresponding to the segmented region SAof the sheet S onto a holding surface of a sheet holder SH, and moves in the X axis direction (the −X direction) with a predetermined stroke in synchronization with a mask (a mask stage). At this time, illumination beams corresponding to the parts of a pattern of the mask are irradiated onto the sheet S via projection optical systems. Thereby, the pattern is transferred (formed). After scan-exposure on the segmented region SA, a stage SSTmoves to a standby position within the XY plane. After the stage SSTadsorbs a rear surface portion corresponding to the next segmented region SAof the sheet S onto a holding surface of a sheet holder SH, an exposure is performed by the scan-exposure method similarly to the above, to thereby form the pattern.