The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2013
Filed:
Jul. 11, 2008
Sivaramakrishnan Hariharan, Mumbai, IN;
Owen Chambers, Filton, GB;
Abhay Atmaram Upare, Mumbai, IN;
Damodharan Satagopan, Basheerbagh, IN;
Sivaramakrishnan Hariharan, Mumbai, IN;
Owen Chambers, Filton, GB;
Abhay Atmaram Upare, Mumbai, IN;
Damodharan Satagopan, Basheerbagh, IN;
Piramal Enterprises Limited, Mumbai, Maharashtra, IN;
Abstract
The present invention provides a continuous process for the production of 1,2,2,2-tetrafluoroethyl difluoromethyl ether (desflurane) which comprises feeding continuously optimum molar quantities of 1-chloro-2,2,2-trifluoroethyl difluoromethyl ether (CFCHClOCHF, Isoflurane) and anhydrous hydrogen fluoride, in a reactor in the vapor phase over a fluorination catalyst system comprising a metal pentahalide absorbed on a supporting substrate at a temperature ranging from 100° C. to 180° C., and separating 1,2,2,2-tetrafluoroethyl difluoromethyl ether (desflurane) continuously from the reactor. The process of the present invention enables continuous removal of desflurane product thereby minimizing co-production of byproducts and resulting in high conversion efficiency and yield of desflurane.