The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 19, 2013

Filed:

Jun. 03, 2005
Applicants:

John Dean Albaugh, Freeland, MI (US);

Gregory Scott Becker, Sanford, MI (US);

Sina Maghsoodi, Midland, MI (US);

Eric Scott Moyer, Midland, MI (US);

Sheng Wang, Midland, MI (US);

Craig Rollin Yeakle, Midland, MI (US);

Inventors:

John Dean Albaugh, Freeland, MI (US);

Gregory Scott Becker, Sanford, MI (US);

Sina Maghsoodi, Midland, MI (US);

Eric Scott Moyer, Midland, MI (US);

Sheng Wang, Midland, MI (US);

Craig Rollin Yeakle, Midland, MI (US);

Assignee:

Dow Corning Corporation, Midland, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/075 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
Abstract

This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces films that are useful as planarization layer, interlayer dielectric, passivation layer, gas permeable layer, negative photoresist, antireflective coating, conformal coating and IC packaging.


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