The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2013
Filed:
Oct. 28, 2009
Method for producing a copolymer solution with a uniform concentration for semiconductor lithography
Takanori Yamagishi, Funabashi, JP;
Ichiro Kato, Chiba, JP;
Akiko Tanaka, Sodegaura, JP;
Miyako Asano, Ichihara, JP;
Takanori Yamagishi, Funabashi, JP;
Ichiro Kato, Chiba, JP;
Akiko Tanaka, Sodegaura, JP;
Miyako Asano, Ichihara, JP;
Maruzen Petrochemical Co., Ltd., Chuo-Ku, JP;
Abstract
A method of producing a copolymer solution for semiconductor lithography having a copolymer and a solvent for coating film formation, which copolymer contains at least one repeating unit selected from the group consisting of: a repeating unit (A) having a hydroxyl group; a repeating unit (B) having a structure in which a hydroxyl group is protected by a group which suppresses dissolution into an alkaline developer and which dissociates in the action of an acid; a repeating unit (C) having a lactone structure; and a repeating unit (D) having a cyclic ether structure, the difference in the copolymer concentration among a plurality of containers which were filled with copolymer solution from the same manufacturing lot is not more than a certain range, or the method includes a certain production step.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile