The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 19, 2013

Filed:

Mar. 21, 2012
Applicants:

Ryosuke Yamamoto, Kawasaki, JP;

Hiroki Tanaka, Fuchu, JP;

Naoko Kihara, Matsudo, JP;

Toshiro Hiraoka, Yokohama, JP;

Inventors:

Ryosuke Yamamoto, Kawasaki, JP;

Hiroki Tanaka, Fuchu, JP;

Naoko Kihara, Matsudo, JP;

Toshiro Hiraoka, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 7/06 (2006.01); B32B 18/00 (2006.01); B32B 27/06 (2006.01); B32B 33/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A structure includes a substrate, a first layer formed on the substrate, and a second layer formed on the first layer. The first layer is comprised of self-assembled monolayer and contains 4-(6-hydroxyhexyloxy)-4'-methoxybiphenyl. The second layer is obtained by micro-phase separation of a block copolymer containing a hydrophilic polymer comprised of polyethylene oxide and a hydrophobic polymer comprised of polymethacrylic acid containing azobenzene at the side chain. The second layer contains a cylinder phase with its long axis being oriented perpendicular to the substrate. The thickness T of the second layer is within a range of A≦T≦50 nm, where A is a phase separation period length satisfying 5 nm≦A≦50 nm.


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