The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2013

Filed:

Apr. 14, 2008
Applicant:

Richard Roussel, Singapore, SG;

Inventor:

Richard Roussel, Singapore, SG;

Assignee:

XID Technologies Pte Ltd., Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In the last few years, face expression measurement has been receiving significant attention mainly due to advancements in areas such as face detection, face tracking and face recognition. For face recognition systems, detecting the locations in two-dimension (2D) images where faces are present is a first step to be performed before face expressions can be measured. However, face detection from a 2D image is a challenging task because of variability in imaging conditions, image orientation, pose, presence/absence of facial artefacts facial expression and occlusion. Existing efforts to address the shortcomings of existing face recognition systems deal with technologies for creation of three-dimensional (3D) models of a human subject's face based on a digital photograph of the human subject. However, such technologies are computationally intensive nature and susceptible to errors and hence might not be suitable for deployment. An embodiment of the invention describes a method for identifying face expressions of image objects.


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