The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2013
Filed:
Feb. 26, 2010
Heung-yeol NA, Yongin, KR;
Min-jae Jeong, Yongin, KR;
Jong-won Hong, Yongin, KR;
Eu-gene Kang, Yongin, KR;
Seok-rak Chang, Yongin, KR;
Ki-yong Lee, Yongin, KR;
Jin-wook Seo, Yongin, KR;
Tae-hoon Yang, Yongin, KR;
Yun-mo Chung, Yongin, KR;
Byung-soo SO, Yongin, KR;
Byoung-keon Park, Yongin, KR;
Dong-hyun Lee, Yongin, KR;
Kil-won Lee, Yongin, KR;
Won-bong Baek, Yongin, KR;
Jong-ryuk Park, Yongin, KR;
Bo-kyung Choi, Yongin, KR;
Ivan Maidanchuk, Yongin, KR;
Jae-wan Jung, Yongin, KR;
Heung-Yeol Na, Yongin, KR;
Min-Jae Jeong, Yongin, KR;
Jong-Won Hong, Yongin, KR;
Eu-Gene Kang, Yongin, KR;
Seok-Rak Chang, Yongin, KR;
Ki-Yong Lee, Yongin, KR;
Jin-Wook Seo, Yongin, KR;
Tae-Hoon Yang, Yongin, KR;
Yun-Mo Chung, Yongin, KR;
Byung-Soo So, Yongin, KR;
Byoung-Keon Park, Yongin, KR;
Dong-Hyun Lee, Yongin, KR;
Kil-Won Lee, Yongin, KR;
Won-Bong Baek, Yongin, KR;
Jong-Ryuk Park, Yongin, KR;
Bo-Kyung Choi, Yongin, KR;
Ivan Maidanchuk, Yongin, KR;
Jae-Wan Jung, Yongin, KR;
Samsung Display Co., Ltd., Yongin, KR;
Abstract
An apparatus for thermally processing a plurality of substrates including a process chamber into which a boat having a plurality of substrates stacked thereon is loaded, and a heater chamber separate from the process chamber and having a plurality of heaters to apply heat to the process chamber. Here, the heaters are installed to correspond to all sides of the plurality of substrates. Therefore, it is possible to minimize a temperature distribution in the process chamber and uniformly supply heat to the entire region of the plurality of substrates.