The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2013
Filed:
Jul. 16, 2009
Glenn Michael Mitchell, Sellersville, PA (US);
Stephen Andrew Motika, Kutztown, PA (US);
Andrew David Johnson, Doylestown, PA (US);
Glenn Michael Mitchell, Sellersville, PA (US);
Stephen Andrew Motika, Kutztown, PA (US);
Andrew David Johnson, Doylestown, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
A process for selectively etching a material comprising SiOover silicon, the method comprising the steps of: placing a silicon substrate comprising a layer of a material comprising SiOwithin a reactor chamber equipped with an energy source; creating a vacuum within the chamber; introducing into the reactor chamber a reactive gas mixture comprising a fluorine compound, a polymerizable fluorocarbon, and an inert gas, wherein the reactive gas mixture is substantially free of added oxygen; activating the energy source to form a plasma activated reactive etching gas mixture within the chamber; and selectively etching the material comprising SiOpreferentially to the silicon substrate.