The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2013
Filed:
Sep. 02, 2009
Toyotaro Kinoshita, Osaka, JP;
Toyotaro Kinoshita, Osaka, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A film-formation method is a method for depositing a liquid containing a film material to form a film in a prescribed film formation area enclosed by a partition wall on a substrate. The film-formation method includes forming the partition wall using at least in part a wettability-variable material in which wettability with respect to the liquid is variable, depositing the liquid in the film formation area, varying the wettability of the wettability-variable material in the partition wall in a state in which the liquid is disposed within the film formation area so that liquid affinity of the wettability-variable material becomes higher than liquid affinity of the wettability-variable material before the liquid is deposited in the film formation area, and forming the film by solidifying the film material in the liquid.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile