The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2013
Filed:
Feb. 27, 2009
Applicant:
Vincent Fry, Duarte, CA (US);
Inventor:
Vincent Fry, Duarte, CA (US);
Assignee:
Goodrich Corporation, Charlotte, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23P 19/10 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A gas injector system is provided that allows for improved distribution and directional control of the vapor material in a CVD or CVI process. Gas injector systems may be used without experiencing significant clogging of gas injector tube apertures over multiple CVD procedures. Further, a gas injector system include a dual aperture release system and/or allow vapor material to flow both substantially horizontally and substantially vertically.
Fry, Vincent. (2013). Methods and apparatus for controlled chemical vapor deposition (U.S. Patent No. 8372482). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8372482
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile