The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2013

Filed:

Jul. 18, 2011
Applicants:

John M Hawes, Averill Park, NY (US);

Glenn Kornett, Bonneau Beach, SC (US);

Bjorn Rydin, Horby, SE;

Scott Quigley, Bossier City, LA (US);

Michael a Royo, Delmar, NY (US);

James G Donovan, Norwell, MA (US);

Steven Yook, So. Glens Falls, NY (US);

Inventors:

John M Hawes, Averill Park, NY (US);

Glenn Kornett, Bonneau Beach, SC (US);

Bjorn Rydin, Horby, SE;

Scott Quigley, Bossier City, LA (US);

Michael A Royo, Delmar, NY (US);

James G Donovan, Norwell, MA (US);

Steven Yook, So. Glens Falls, NY (US);

Assignee:

Albany International Corp., Albany, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
D21F 1/10 (2006.01); D21F 7/08 (2006.01); B32B 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a multilayer multiaxial woven fabric for a papermachine having a reduced interference pattern and accordingly improved dewatering uniformity. The present invention also provides a method of forming such multilayer multiaxial fabric.


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