The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 12, 2013

Filed:

Nov. 18, 2010
Applicants:

Chen-liang LI, Taipei County, TW;

Kuo-hsiang Wang, Taipei, TW;

Inventors:

Chen-Liang Li, Taipei County, TW;

Kuo-Hsiang Wang, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D03D 13/00 (2006.01); D03D 15/00 (2006.01); D03D 1/00 (2006.01); D03D 25/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A fabric structure includes a first fabric layer, a second fabric layer, a plurality of conductive yarns, and a plurality of connecting yarns. A yarn coverage ratio of the first fabric layer ranges from about 90% to about 100%. A yarn coverage ratio of the second fabric layer ranges from about 90% to about 100%. The conductive yarns are distributed between the first fabric layer and the second fabric layer. The connecting yarns interlace the first fabric layer and the second fabric layer, so that the conductive yarns are sandwiched between the first fabric layer and the second fabric layer. The conductive yarns and the connecting yarns are not interlaced.


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