The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Jun. 10, 2009
Ewan Findlay, Lothian, GB;
Andrew Harvey, Lothian, GB;
Bertrand Lucotte, Lothian, GB;
Gonzalo Muyo, Lothian, GB;
Mads Demenikov, Edinburgh, GB;
Ewan Findlay, Lothian, GB;
Andrew Harvey, Lothian, GB;
Bertrand Lucotte, Lothian, GB;
Gonzalo Muyo, Lothian, GB;
Mads Demenikov, Edinburgh, GB;
STMicroelectronics (Research & Development) Ltd, Marlow, Buckinghamshire, GB;
Abstract
PSF coding has become well known in recent years. Although it enables significant increases in the depth of field, defocus introduces artifacts in images that are a major detraction from the final image quality. A method is described that enables the deduction or defocus and consequently the removal of these artifacts. The principle of the disclosed techniques involves iteratively adjusting the restoration algorithm according to a chosen image or artifact metric and choosing the defocus parameter that yields the image the lowest level of artifact.