The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Aug. 06, 2009
Beilei Xu, Penfield, NY (US);
Robert Paul Loce, Webster, NY (US);
Chu-heng Liu, Penfield, NY (US);
Ying-wei Lin, Penfield, NY (US);
Beilei Xu, Penfield, NY (US);
Robert Paul Loce, Webster, NY (US);
Chu-Heng Liu, Penfield, NY (US);
Ying-wei Lin, Penfield, NY (US);
Xerox Corporation, Norwalk, CT (US);
Abstract
A method for determining local defocus distance in a scanned image of a non-planar original object is provided comprising scanning at least a portion of the non-planar original object to produce first scanned image data at a first focal plane and scanning same the at least a portion of the non-planar original object to produce at least second scanned image data at a second focal plane. The first scanned image data is different from the second scanned image data wherein a distance between the first focal plane and the second focal plane is a predetermined quantity. The method further comprises estimating an out-of-focus distance of the object from the first and the second scanned image data.