The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Mar. 09, 2009
Viet Nguyen Hoang, Leuven, BE;
Radu Surdeanu, Roosbeek, BE;
Benoit Bataillou, Lyons, FR;
NXP, B.V., Eindhoven, NL;
Abstract
The present invention relates to a manufacturing method of an integrated circuit (IC) comprising a substrate () comprising a pixelated element () and a light path () to the pixelated element (). The IC comprises a first dielectric layer () covering the substrate () but not the pixilated element (), a first metal layer () covering a part of the first dielectric layer (), a second dielectric layer () covering a further part of first dielectric layer (), a second metal layer () covering a part of the second dielectric layer () and extending over the pixelated element () and a part of the first metal layer (), the first metal layer () and the second metal layer () forming an air-filled light path () to the pixelated element (). The air-filled light path () is formed by creation of holes in the first dielectric layer () and the second dielectric layer (), filling the holes with sacrificial materials, and removal of the sacrificial materials after deposition and patterning of the second metal layer (). This yields an IC having a low-loss light path to the pixelated element (). The light path may act as a color filter, e.g. a Fabry-Perot color filter.