The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2013

Filed:

Sep. 02, 2009
Applicants:

Osamu Nakayama, Niigata, JP;

Takashi Fukumoto, Niigata, JP;

Jyunko Sato, Niigata, JP;

Toshiki Endo, Niigata, JP;

Hideki Matsuda, Niigata, JP;

Inventors:

Osamu Nakayama, Niigata, JP;

Takashi Fukumoto, Niigata, JP;

Jyunko Sato, Niigata, JP;

Toshiki Endo, Niigata, JP;

Hideki Matsuda, Niigata, JP;

Assignee:

Kuraray Co., Ltd., Okayama, JP;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07D 327/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

There is provided a means to produce industrially a highly pure 2-hydroxy-4-oxa-5-thiatricyclo[4.2.1.0]nonane 5,5-dioxide derivative in high yield from highly pure and industrially available raw materials. The production method for a sultone derivative of the present invention comprises a step (A) to obtain a sulfonic acid derivative by hydrolyzing a sulfonyl halide derivative represented by the following chemical formula 1: or an enantiomer thereof and a step (B) to obtain a corresponding sultone derivative represented by the following chemical formula 2: or an enantiomer thereof by treating the sulfonic acid derivative with a oxidizing agent.


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