The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Jul. 13, 2010
Robert E. Doty, Los Angeles, CA (US);
Alan J. Jacobsen, Woodland Hills, CA (US);
Joanne A. Kolodziejska, Woodland Hills, CA (US);
Robert E. Doty, Los Angeles, CA (US);
Alan J. Jacobsen, Woodland Hills, CA (US);
Joanne A. Kolodziejska, Woodland Hills, CA (US);
HRL Laboratories, LLC, Malibu, CA (US);
Abstract
A system for forming a plurality of polymer waveguides includes at least one collimated light source adapted to produce a plurality of collimated light beams; a channel having an exposure area for the collimated light beams to pass through and for holding a photo-monomer adapted to polymerize when exposed to the collimated light beams, the photo-monomer moving with respect to the plurality of collimated light beams; and a mask disposed between the at least one collimated light source and the photo-monomer. A method for forming a plurality of polymer waveguides includes moving a mask across an exposure area of a channel containing a photo-monomer; exposing the photo-monomer to collimated light through the exposure area of the channel; growing the plurality of polymer waveguides from the exposure area into the photo-monomer to form an interconnected ordered three-dimensional polymer micro-truss structure; and removing the ordered 3D polymer micro-truss structure from the channel.