The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
May. 12, 2010
Applicants:
Bo-kyoung Ahn, Incheon, KR;
Gug-rae JO, Asan-si, KR;
Hong-suk Yoo, Anyang-si, KR;
Chang-hoon Kim, Asan-si, KR;
Min-uk Kim, Seongnam-si, KR;
Joo-han Bae, Suwon-si, KR;
Inventors:
Bo-Kyoung Ahn, Incheon, KR;
Gug-Rae Jo, Asan-si, KR;
Hong-Suk Yoo, Anyang-si, KR;
Chang-Hoon Kim, Asan-si, KR;
Min-Uk Kim, Seongnam-si, KR;
Joo-Han Bae, Suwon-si, KR;
Assignee:
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photoresist layer exposed through first slits of a mask is exposed using first light. The photoresist layer exposed through second slits of the mask is exposed by using second light. The first light passes thorough a transflective shutter to generate the second light.