The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Jun. 25, 2010
Oh-seob Kwon, Yongin, KR;
Jae-yong Kim, Yongin, KR;
Sung-chul Kim, Yongin, KR;
Kyoung-bo Kim, Yongin, KR;
Il-jeong Lee, Yongin, KR;
Cheol-ho Yu, Yongin, KR;
Yong-woo Park, Yongin, KR;
Han-hee Yoon, Yongin, KR;
In-young Jung, Yongin, KR;
Oh-Seob Kwon, Yongin, KR;
Jae-Yong Kim, Yongin, KR;
Sung-Chul Kim, Yongin, KR;
Kyoung-Bo Kim, Yongin, KR;
Il-Jeong Lee, Yongin, KR;
Cheol-Ho Yu, Yongin, KR;
Yong-Woo Park, Yongin, KR;
Han-Hee Yoon, Yongin, KR;
In-Young Jung, Yongin, KR;
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Abstract
Embodiments relate to halftone masks that can uniformly form the height of an underlying layer in two regions that are spaced apart from each other, a manufacturing method thereof, and a method for forming a film using the same. The halftone mask includes a first light blocking unit and a second light blocking unit, and a semi-transmitting unit that is disposed adjacent to the side of the second light blocking unit. The first and second light blocking units block light and are spaced apart from each other at a predetermined interval. The semi-transmitting unit is positioned at a side far from the first light blocking unit and reduces intensity of light. Sum of the second length of the second light blocking unit and the third length of the semi-transmitting unit is larger than the first length of the first blocking unit.