The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Mar. 25, 2008
Kohei Yokoyama, Kanagawa, JP;
Hisao Ikeda, Kanagawa, JP;
Yosuke Sato, Kanagawa, JP;
Tomoya Aoyama, Kanagawa, JP;
Takahiro Ibe, Kanagawa, JP;
Yoshiharu Hirakata, Kanagawa, JP;
Kohei Yokoyama, Kanagawa, JP;
Hisao Ikeda, Kanagawa, JP;
Yosuke Sato, Kanagawa, JP;
Tomoya Aoyama, Kanagawa, JP;
Takahiro Ibe, Kanagawa, JP;
Yoshiharu Hirakata, Kanagawa, JP;
Abstract
For a full-color flat panel display, demands for high definition, high aperture ratio and high reliability have been increasing. Therefore, increasing in the number of pixels and narrowing a pixel pitch have been major issues. According to the present invention, a layer including an organic compound is selectively formed with a light-exposure apparatus used in a photolithography technique without a resist mask. A material layer including a photopolymerization initiator, a material polymerized with the photopolymerization initiator, and an organic compound are formed on a plate, and then are exposed to light and selectively cured. A film-formation substrate is disposed so as to face the plate. The film-formation substrate or the material layer is heated so that the organic compound included in a region exposed to light or a region not exposed to light is evaporated to be selectively deposited on the surface of the film-formation substrate.