The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Nov. 04, 2010
Rong-zhi Chen, Kaohsiung, TW;
Chun-hao Chiu, Kaohsiung County, TW;
Jui-tung Chang, Tainan, TW;
Deng-far Hsu, Kaohsiung County, TW;
Chih-huang Lai, Hsinchu, TW;
Rong-Zhi Chen, Kaohsiung, TW;
Chun-Hao Chiu, Kaohsiung County, TW;
Jui-Tung Chang, Tainan, TW;
Deng-Far Hsu, Kaohsiung County, TW;
Chih-Huang Lai, Hsinchu, TW;
China Steel Corporation, Kaohsiung, TW;
Abstract
A method for manufacturing a cobalt (Co) alloy-based ceramic composite sputtering target is provided. A cobalt ingot and a chromium (Cr) ingot are melted in vacuum and then nebulized to form a cobalt-chromium (CoCr) alloy powder. Additionally, a ceramic powder and a platinum powder are wetly mixed to form a platinum-ceramic (Pt-ceramic) slurry, in which the ceramic powder is applied onto the platinum powder's surface uniformly. Next, the CoCr alloy powder and the Pt-ceramic slurry are wetly mixed to form a CoCrPt-ceramic slurry. Thereafter, the CoCrPt-ceramic slurry is dried, molded and compressed to form the cobalt alloy-based ceramic composite sputtering target. The resulted cobalt alloy-based ceramic composite sputtering target, which has a fine and dense structure, uniform composition and lower magnetic permeability, is beneficial to a magnetron sputter deposition process, as well as a film sputtering process used in the magnetic recording industry.