The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Jul. 30, 2008
Terunori Yamaguchi, Izumiotsu, JP;
Shinji Hashiguchi, Izumiotsu, JP;
Mitsuo Ueno, Tokyo, JP;
Stella Chemifa Corporation, Osaka, JP;
Abstract
It is intended to provide a method of producing a hollow construct, which may be in various shapes such as a fiber or a film as well as in various sizes and has chemical resistance, made of a fluorinated hydrocarbon polymer, a fluorinated carbon polymer or a polymer carrying a nitrogen-containing group, a silicon-containing group, an oxygen-containing group, a phosphorus-containing group or a sulfur-containing group having been introduced into the above-described polymer; and a hollow construct obtained by this method. The method of producing a hollow construct as described above is characterized by comprising the fluorination step wherein a construct made of a hydrocarbon polymer or a polymer carrying a nitrogen-containing group, a silicon-containing group, an oxygen-containing group, a phosphorus-containing group or a sulfur-containing group having been introduced into the above-described polymer is brought into contact with a treating gas containing fluorine under definite conditions and thus the treating gas is allowed to penetrate from the outer surface of the construct toward the inside thereof to thereby fluorinate the construct excluding the core part, and the removal step wherein the core part having been not fluorinated as described above is removed.