The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Dec. 02, 2009
Masafumi Morisue, Tokyo, JP;
Takumi Suzuki, Yokohama, JP;
Masahiko Kubota, Tokyo, JP;
Ryoji Kanri, Zushi, JP;
Akihiko Okano, Kawasaki, JP;
Atsushi Hiramoto, Yokohama, JP;
Masafumi Morisue, Tokyo, JP;
Takumi Suzuki, Yokohama, JP;
Masahiko Kubota, Tokyo, JP;
Ryoji Kanri, Zushi, JP;
Akihiko Okano, Kawasaki, JP;
Atsushi Hiramoto, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A liquid discharge head includes an Si substrate which is provided with an element for generating energy used in discharging a liquid and a liquid supply port which is provided to pass through the Si substrate from a first surface to a rear surface so as to supply a liquid to the element. A method of manufacturing the substrate includes: forming a plurality of concave portions on the rear surface of the Si substrate of which a plane orientation is {100}, the concave portions facing the first surface and aligned in rows along a <100> direction of the Si substrate; and forming a plurality of the liquid supply ports by carrying out a crystal axis anisotropic etching on the Si substrate through the concave portions using an etching liquid of which an etching rate of the {100} plane of the Si substrate is slower than that of the {110} plane of the Si substrate.