The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Sep. 05, 2008
Mitsuru Chida, Yokohama, JP;
Toshiyasu Sakai, Oita, JP;
Noriyasu Ozaki, Atsugi, JP;
Hiroyuki Abo, Chigasaki, JP;
Kazuya Abe, Tokyo, JP;
Kenji Ono, Tokyo, JP;
Mitsuru Chida, Yokohama, JP;
Toshiyasu Sakai, Oita, JP;
Noriyasu Ozaki, Atsugi, JP;
Hiroyuki Abo, Chigasaki, JP;
Kazuya Abe, Tokyo, JP;
Kenji Ono, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for manufacturing a liquid-ejection head substrate including a silicon substrate having a supply port for supplying liquid is provided. The method includes: forming an etching mask layer on a surface of the silicon substrate, the etching mask layer having an opening in a portion corresponding to the supply port; forming a first recess in the surface of the silicon substrate by anisotropically etching the silicon substrate through the opening in the etching mask layer; forming a second recess that extends toward the other surface of the silicon substrate, in a surface of the first recess in the silicon substrate; and forming the supply port by anisotropically etching the silicon substrate from the surface provided with the second recess.