The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2013
Filed:
Jan. 18, 2007
Applicant:
Yuichi Iwasaki, Utsunomiya, JP;
Inventor:
Yuichi Iwasaki, Utsunomiya, JP;
Assignee:
Canon Kabishiki Kaisha, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure apparatus () configured to expose a pattern of a reticle () via a liquid (LW) filled between a final lens of a projection optical system () and a substrate () includes a stage () configured to drive the substrate, a shield () configured to enclose the stage so as to form a shield space (SS) around the stage, the shield having an opening for an import or an export of the substrate, and a unit, such as a load lock chamber (), configured to prevent a vapor of the liquid to going out of the shield space and to reduce an outflow amount of the vapor.